반도체제조용 Furnace

제품코드	G046049
판매 회사명	(주)피앤테크
연락처	043-211-3917
홈페이지	-
제품홍보관	http://blog.yeogie.com/p-tech2000

PF-D81 Furnace System

Semiconductor Process Application - Wet/Dry Oxidation - N2/H2 Sinter - Anneal - Poly - Nitride - HTO

PF-D81 Series System Features

-Wafer size : 125mm,150mm, 200mm

- Load Capacity : 75 Wafers
-  Thermal uniformity  accuracy :
   * Between 400℃ and 800℃ ±1℃
   * Between 800℃ and 1150℃ ±0.5℃
-  Ramp rate : 0.1~ 25℃ per minute

-  Operating temperature range : 400℃ ~ 1150℃
-  Boat  Speed : 3~125 cm / minute
-  3 Zone  by Spikes and  Profile T/C

※ 출처 : 여기에 기계플라자 - [G046049] 반도체제조용 Furnace