반도체제조용 Furnace 썸네일형 리스트형 반도체제조용 Furnace 제품코드G046051판매 회사명(주)피앤테크연락처043-211-3917홈페이지-제품홍보관http://blog.yeogie.com/p-tech2000 PF-V12 Vertical Furnace System Semiconductor Process Application - Oxidation - N2/H2 AnnealingPF-V12 Series System Features - Wafer size : 125mm,150mm, 200mm, 300mm- Load Capacity : 75 Wafers - Thermal uniformity accuracy : * Between 400℃ and 800℃ ±1℃ * Between 800℃ and 1150℃ ±0.5℃ - Ramp rate : 0.1~ 25℃ per minut.. 더보기 반도체제조용 Furnace 제품코드G046049판매 회사명(주)피앤테크연락처043-211-3917홈페이지-제품홍보관http://blog.yeogie.com/p-tech2000 PF-D81 Furnace System Semiconductor Process Application - Wet/Dry Oxidation - N2/H2 Sinter - Anneal - Poly - Nitride - HTO PF-D81 Series System Features -Wafer size : 125mm,150mm, 200mm- Load Capacity : 75 Wafers - Thermal uniformity accuracy : * Between 400℃ and 800℃ ±1℃ * Between 800℃ and 1150℃ ±0.5℃ - Ramp rate.. 더보기 반도체제조용 Furnace 제품코드G046048판매 회사명(주)피앤테크연락처043-211-3917홈페이지-제품홍보관http://blog.yeogie.com/p-tech2000 PF-D82 Furnace System Solar Cell Process Application - POCl3 - BBr3 - N2/H2 Annealing - OxidationPF-D82 Series System Features - Wafer size : 125mm * 125mm, 156mm * 156mm- Load Capacity : 1~75 Wafers / Tube - Thermal uniformity accuracy : * Between 400℃ and 800℃ ±1℃ * Between 800℃ and 1150℃ ±0.5℃ - Ramp rate : 0.1.. 더보기 이전 1 다음